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YONG, KIJUNG(용기중) scopus

Department: Dept. of Chemical Engineering(화학공학과)

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Date Issued : 2006

Article

A novel heteronanostructure system: Hierarchical W nanothorn arrays on WO3 nanowhiskersSCIESCOPUS

ADVANCED MATERIALS, vol. 18, no. 23, page. 3105 - 3110, 2006-12-04

Article

Growth of zirconium silicate thin film by pulsed-MOCVD using ZTB and TDEASSCIESCOPUS

SURFACE REVIEW AND LETTERS, vol. 13, no. 5, page. 567 - 571, 2006-10

Article

Growth and characterization of Hf-silicate/Al2O3 gate stacks grown on Si(100) by self-limiting atomic layer depositionSCIESCOPUS

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, vol. 45, no. 9A, page. 7080 - 7083, 2006-09

Article

Physical and electrical characterizations of ultrathin Si-rich Hf-silicate film and Hf-silicate/SiO2 bilayer deposited by atomic layer chemical vapor depositionSCIESCOPUS

JOURNAL OF APPLIED PHYSICS, vol. 100, no. 4, page. 44106-1 - 44106-5, 2006-08-15

Article

Photocatalytic Ohmic layered nanocomposite for efficient utilization of visible light photonsSCIESCOPUS

APPLIED PHYSICS LETTERS, vol. 89, no. 6, 2006-08-07

Article

Structural characterization of beta-SiC nanowires synthesized by direct heating methodSCIESCOPUS

MATERIALS SCIENCE & ENGINEERING C-BIOMIMETIC AND SUPRAMOLECULAR SYSTEMS, vol. 26, no. 5-7, page. 805 - 808, 2006-07

Article

Characterization of ZnO nanorod arrays fabricated on Si wafers using a low-temperature synthesis methodSCIESCOPUS

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, vol. 24, no. 4, page. 2047 - 2052, 2006-07

Article

Highly conformal hafnium silicate film growth by atomic-layer chemical vapor deposition using a new combination of precursors: Hf(OC(CH3)(3))(4) and Si(N(CH3)(C2H5))(4)SCIESCOPUS

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, vol. 45, no. 6A, page. 5174 - 5177, 2006-06

Article

Thermal stability of chemical vapor deposition grown W and WNx thin films in low-k integration structureSCIESCOPUS

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, vol. 24, no. 3, page. 1428 - 1431, 2006-05

Article

Photoelectron spectroscopic analysis of Hf-silicate/SiO2/Si stacks deposited by atomic layer chemical vapor depositionSCIESCOPUS

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, vol. 24, no. 3, page. 1147 - 1150, 2006-05

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