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Photoelectron spectroscopic analysis of Hf-silicate/SiO2/Si stacks deposited by atomic layer chemical vapor deposition

Title
Photoelectron spectroscopic analysis of Hf-silicate/SiO2/Si stacks deposited by atomic layer chemical vapor deposition
Authors
Kim, JYong, KJ
POSTECH Authors
Yong, KJ
Date Issued
Apr-2006
Publisher
A V S AMER INST PHYSICS
URI
http://oasis.postech.ac.kr/handle/2014.oak/11288
DOI
10.1116/1.2190656
ISSN
1071-1023
Article Type
Article
Citation
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, vol. 24, no. 3, page. 1147 - 1150, 2006-04
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용기중YONG, KIJUNG
Dept. of Chemical Enginrg
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