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KIM, HYUNGJUN(김형준)

Department: Dept of Materials Science & Engineering(신소재공학과)

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Publication & Time Cited Count (For the Last 5 years)

Results 1-6 of 6 (Search time: 0.001 seconds).

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Subject : METAL

Article

Atomic Layer Deposition of Ni Thin Films and Application to Area-Selective DepositionSCIESCOPUS

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, vol. 158, no. 1, page. D1 - D5, 2011-01

Article

ATOMIC LAYER DEPOSITION OF RUTHENIUM AND RUTHENIUM-OXIDE THIN FILMS BY USING A RU(ETCP)(2) PRECURSOR AND OXYGEN GASSCIESCOPUSKCI

JOURNAL OF THE KOREAN PHYSICAL SOCIETY, vol. 55, no. 1, page. 32 - 37, 2009-07

Article

ZnO thin films prepared by atomic layer deposition and rf sputtering as an active layer for thin film transistorSCIESCOPUS

THIN SOLID FILMS, vol. 516, no. 7, page. 1523 - 1528, 2008-02-15

Article

Ru nanostructure fabrication using an anodic aluminum oxide nanotemplate and highly conformal Ru atomic layer depositionSCIESCOPUS

NANOTECHNOLOGY, vol. 19, no. 4, 2008-01-30

Article

Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactantsSCIESCOPUS

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, vol. 24, no. 5, page. 2276 - 2281, 2006-09

Article

Thermal and plasma-enhanced ALD of Ta and Ti oxide thin films from alkylamide precursorsSCIESCOPUS

ELECTROCHEMICAL AND SOLID STATE LETTERS, vol. 9, no. 6, page. G191 - G194, 2006-01

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