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KIM, HYUNGJUN(김형준)

Department: Dept of Materials Science & Engineering(신소재공학과)

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Publication & Time Cited Count (For the Last 5 years)

Results 1-8 of 8 (Search time: 0.001 seconds).

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Subject : CHEMICAL-VAPOR-DEPOSITION

Article

Selective epitaxial growth of Si1-xGex films via the alternating gas supply of Si2H6, GeH4, and Cl-2: Effects of Cl-2 exposureSCIESCOPUS

MATERIALS LETTERS, vol. 88, page. 89 - 92, 2012-12-01

Article

ATOMIC LAYER DEPOSITION OF RUTHENIUM AND RUTHENIUM-OXIDE THIN FILMS BY USING A RU(ETCP)(2) PRECURSOR AND OXYGEN GASSCIESCOPUSKCI

JOURNAL OF THE KOREAN PHYSICAL SOCIETY, vol. 55, no. 1, page. 32 - 37, 2009-07

Article

Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer DepositionSCIESCOPUS

SMALL, vol. 4, no. 12, page. 2247 - 2254, 2008-12

Article

Effect oxygen exposure on the quality of atomic layer deposition of ruthenium from bis(cyclopentadienyl)ruthenium and oxygenSCIESCOPUS

THIN SOLID FILMS, vol. 516, no. 21, page. 7345 - 7349, 2008-09-01

Article

Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactantsSCIESCOPUS

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, vol. 24, no. 5, page. 2276 - 2281, 2006-09

Article

The application of atomic layer deposition for metallization of 65 nm and beyondSCIESCOPUS

SURFACE & COATINGS TECHNOLOGY, vol. 200, no. 10, page. 3104 - 3111, 2006-02-24

Kim, H

Article

Thermal and plasma-enhanced ALD of Ta and Ti oxide thin films from alkylamide precursorsSCIESCOPUS

ELECTROCHEMICAL AND SOLID STATE LETTERS, vol. 9, no. 6, page. G191 - G194, 2006-01

Article

High-quality cobalt thin films by plasma-enhanced atomic layer depositionSCIESCOPUS

ELECTROCHEMICAL AND SOLID STATE LETTERS, vol. 9, no. 11, page. G323 - G325, 2006-01

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