Patterning of an amine-terminated nanolayer by extreme ultraviolet
SCIE
SCOPUS
- Title
- Patterning of an amine-terminated nanolayer by extreme ultraviolet
- Authors
- Moon, S; Chung, S; Jeon, C; Park, CY; Hwang, HN; Hwang, CC; Song, H; Shin, HJ
- Date Issued
- 2007-11-05
- Publisher
- AMER INST PHYSICS
- Abstract
- The adsorption of NH3 molecules on the Si(100)2x1 surface constructs a cleaner and more well-defined amine layer than self-assembled monolayer such as aminosilylated layer, which make it possible to study photoinduced reactions between amines and monochromatic light with shorter wavelength than ultraviolet, i.e., extreme ultraviolet and soft x ray. We report that the molecular layer of amine groups reacts with extreme ultraviolet and soft x ray, which can be used to make fine patterns on the amine-terminated layer. The amine patterning with the leading postoptical lithography using extreme ultraviolet could be applied to fabricating future molecular nanodevices.
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/9575
- DOI
- 10.1063/1.2803216
- ISSN
- 0003-6951
- Article Type
- Article
- Citation
- APPLIED PHYSICS LETTERS, vol. 91, no. 19, 2007-11-05
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