Patterning of an amine-terminated nanolayer by extreme ultraviolet
- Title
- Patterning of an amine-terminated nanolayer by extreme ultraviolet
- Authors
- Moon, S; Chung, S; Jeon, C; Park, CY; Hwang, HN; Hwang, CC; Song, H; Shin, HJ
- POSTECH Authors
- Chung, S
- Date Issued
- Jan-2007
- Publisher
- AMER INST PHYSICS
- URI
- http://oasis.postech.ac.kr/handle/2014.oak/9575
- DOI
- 10.1063/1.2803216
- ISSN
- 0003-6951
- Article Type
- Article
- Citation
- APPLIED PHYSICS LETTERS, vol. 91, no. 19, 2007-01
- Files in This Item:
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