DC Field | Value | Language |
---|---|---|
dc.contributor.author | Moon, S | - |
dc.contributor.author | Chung, S | - |
dc.contributor.author | Jeon, C | - |
dc.contributor.author | Park, CY | - |
dc.contributor.author | Hwang, HN | - |
dc.contributor.author | Hwang, CC | - |
dc.contributor.author | Song, H | - |
dc.contributor.author | Shin, HJ | - |
dc.date.accessioned | 2015-06-25T01:17:17Z | - |
dc.date.available | 2015-06-25T01:17:17Z | - |
dc.date.created | 2009-03-19 | - |
dc.date.issued | 2007-11-05 | - |
dc.identifier.issn | 0003-6951 | - |
dc.identifier.other | 2015-OAK-0000007293 | en_US |
dc.identifier.uri | https://oasis.postech.ac.kr/handle/2014.oak/9575 | - |
dc.description.abstract | The adsorption of NH3 molecules on the Si(100)2x1 surface constructs a cleaner and more well-defined amine layer than self-assembled monolayer such as aminosilylated layer, which make it possible to study photoinduced reactions between amines and monochromatic light with shorter wavelength than ultraviolet, i.e., extreme ultraviolet and soft x ray. We report that the molecular layer of amine groups reacts with extreme ultraviolet and soft x ray, which can be used to make fine patterns on the amine-terminated layer. The amine patterning with the leading postoptical lithography using extreme ultraviolet could be applied to fabricating future molecular nanodevices. | - |
dc.description.statementofresponsibility | open | en_US |
dc.language | English | - |
dc.publisher | AMER INST PHYSICS | - |
dc.relation.isPartOf | APPLIED PHYSICS LETTERS | - |
dc.rights | BY_NC_ND | en_US |
dc.rights.uri | http://creativecommons.org/licenses/by-nc-nd/2.0/kr | en_US |
dc.title | Patterning of an amine-terminated nanolayer by extreme ultraviolet | - |
dc.type | Article | - |
dc.contributor.college | 물리학과 | en_US |
dc.identifier.doi | 10.1063/1.2803216 | - |
dc.author.google | Moon, S | en_US |
dc.author.google | Chung, S | en_US |
dc.author.google | Shin, HJ | en_US |
dc.author.google | Song, H | en_US |
dc.author.google | Hwang, CC | en_US |
dc.author.google | Hwang, HN | en_US |
dc.author.google | Park, CY | en_US |
dc.author.google | Jeon, C | en_US |
dc.relation.volume | 91 | en_US |
dc.relation.issue | 19 | en_US |
dc.contributor.id | 10071841 | en_US |
dc.relation.journal | APPLIED PHYSICS LETTERS | en_US |
dc.relation.index | SCI급, SCOPUS 등재논문 | en_US |
dc.relation.sci | SCI | en_US |
dc.collections.name | Journal Papers | en_US |
dc.type.rims | ART | - |
dc.identifier.bibliographicCitation | APPLIED PHYSICS LETTERS, v.91, no.19 | - |
dc.identifier.wosid | 000250810300069 | - |
dc.date.tcdate | 2019-01-01 | - |
dc.citation.number | 19 | - |
dc.citation.title | APPLIED PHYSICS LETTERS | - |
dc.citation.volume | 91 | - |
dc.contributor.affiliatedAuthor | Chung, S | - |
dc.identifier.scopusid | 2-s2.0-36048943926 | - |
dc.description.journalClass | 1 | - |
dc.description.journalClass | 1 | - |
dc.description.wostc | 5 | - |
dc.description.scptc | 5 | * |
dc.date.scptcdate | 2018-10-274 | * |
dc.type.docType | Article | - |
dc.subject.keywordPlus | SURFACE | - |
dc.subject.keywordPlus | DISSOCIATION | - |
dc.subject.keywordPlus | LITHOGRAPHY | - |
dc.subject.keywordPlus | DESORPTION | - |
dc.subject.keywordPlus | MONOLAYERS | - |
dc.subject.keywordPlus | RESOLUTION | - |
dc.subject.keywordPlus | EXPOSURE | - |
dc.subject.keywordPlus | SI(100) | - |
dc.subject.keywordPlus | FILMS | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Physics | - |
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