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Atomic layer deposition of hafnium silicate thin films using a novel single precursor

Title
Atomic layer deposition of hafnium silicate thin films using a novel single precursor
Authors
이시우
Publisher
The Asia-Pacific chemical reaction engineering working party
URI
https://oasis.postech.ac.kr/handle/2014.oak/91247
Article Type
Conference
Citation
The 4th Asia-Pacific Chemical Reaction Engineering Symposium (APCRE'05)
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