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Effects of various pre-intrinsic and phosphorus gettering treatments upon quality of neat surface region in CZ silicon wafer during a simulated 4 MB DRAM process

Title
Effects of various pre-intrinsic and phosphorus gettering treatments upon quality of neat surface region in CZ silicon wafer during a simulated 4 MB DRAM process
Authors
김오현
Date Issued
1990-05-01
URI
https://oasis.postech.ac.kr/handle/2014.oak/90902
Article Type
Conference
Citation
The Electro-Chemical Society Meeting, 1990-05-01
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김오현KIM, OHYUN
Dept of Electrical Enginrg
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