Hf-based Thin Films on Si and Ge Substrate by Plasma-Enhanced Atomic Layer Deposition
- Title
- Hf-based Thin Films on Si and Ge Substrate by Plasma-Enhanced Atomic Layer Deposition
- Authors
- 김형준
- Publisher
- ICMAT
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/83926
- Article Type
- Conference
- Citation
- 1st International Conference on Microelectronics and Plasma Technology
- Files in This Item:
- There are no files associated with this item.
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.