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Remote plasma enhanced metal organic chemical vapor deposition of TiN for diffusion barrier
- Title
- Remote plasma enhanced metal organic chemical vapor deposition of TiN for diffusion barrier
- Authors
- 이시우
- Date Issued
- 1996-01-01
- Article Type
- Conference
- Citation
- Key Tech. & Appl. of Adv. Mater., Proc. of 2nd Korean-Japan Symposium on Adv. Mater., page. 202, 1996-01-01
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