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dc.contributor.author이시우-
dc.date.accessioned2018-06-21T13:52:12Z-
dc.date.available2018-06-21T13:52:12Z-
dc.date.created2009-03-27-
dc.date.issued1996-01-01-
dc.identifier.urihttps://oasis.postech.ac.kr/handle/2014.oak/82811-
dc.relation.isPartOfKey Tech. & Appl. of Adv. Mater., Proc. of 2nd Korean-Japan Symposium on Adv. Mater.-
dc.relation.isPartOfKey Tech. & Appl. of Adv. Mater., Proc. of 2nd Korean-Japan Symposium on Adv. Mater-
dc.titleRemote plasma enhanced metal organic chemical vapor deposition of TiN for diffusion barrier-
dc.typeConference-
dc.type.rimsCONF-
dc.identifier.bibliographicCitationKey Tech. & Appl. of Adv. Mater., Proc. of 2nd Korean-Japan Symposium on Adv. Mater., pp.202-
dc.citation.startPage202-
dc.citation.titleKey Tech. & Appl. of Adv. Mater., Proc. of 2nd Korean-Japan Symposium on Adv. Mater.-
dc.contributor.affiliatedAuthor이시우-
dc.description.journalClass1-
dc.description.journalClass1-

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