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Plasma Enhanced chemical vapor Deposition and Characterization of SiCOH low k Films with Vinyltrimethylsilane, di and Tetravinyl silane
- Title
- Plasma Enhanced chemical vapor Deposition and Characterization of SiCOH low k Films with Vinyltrimethylsilane, di and Tetravinyl silane
- Authors
- 이시우
- Date Issued
- 2006-02-23
- Publisher
- 한국 반도체 학술대회
- Article Type
- Conference
- Citation
- 제13회 한국 반도체 학술대회, page. 873, 2006-02-23
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