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In-situ synchrotron X-ray scattering study on the initial structure of Ta(C)N Atomic Layer Deposition films for the electronic devices.
- Title
- In-situ synchrotron X-ray scattering study on the initial structure of Ta(C)N Atomic Layer Deposition films for the electronic devices.
- Date Issued
- 2008-08-06
- Publisher
- "Korea-Japan
- Article Type
- Conference
- Citation
- KJC-FE07, 2008-08-06
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