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In-situ synchrotron X-ray scattering study on the initial structure of Ta(C)N Atomic Layer Deposition films for the electronic devices.

Title
In-situ synchrotron X-ray scattering study on the initial structure of Ta(C)N Atomic Layer Deposition films for the electronic devices.
Authors
백성기박용준김석훈이동열송문균이시우
Date Issued
6-Aug-2008
Publisher
"Korea-Japan
URI
http://oasis.postech.ac.kr/handle/2014.oak/58543
Article Type
Conference
Citation
KJC-FE07, 2008-08-06
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