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실리콘에 도핑된 붕소의 정량분석에 대한 공동분석연구

Title
실리콘에 도핑된 붕소의 정량분석에 대한 공동분석연구
Authors
KIM, JAE NAMKIM, KYUNG JOONGKIM, HYUN KYUNGMOON, DAE WONHONG, TAE ENJEONG, CHIL SUNGKIM, YI KYUNGLIM CEOL HOKIM, JEONG HO
Date Issued
2002-12
Publisher
한국진공학회
Abstract
A domestic round robin test(RRT) for the quantitative analysis of minor impurities was performed by a standard procedure and standard reference material. The certified reference material(CRM)s for B-doped Si thin film and analysis specimens and the analysis specimens were prepared by an ion beam sputter deposition method. These samples were certified by inductively coupled plasma mass spectrometry(ICP-MS) with isotope dilution method which is one of the most quantitative methods in chemical analysis. By using an international standard procedure(ISO/DIS-14237) for the quantitative analysis of B in Si by SIMS, a domestic RRT was performed for these specimens. Although only a few laboratories participated in this RRT, the average B concentration well agreed with the certified value within 2% error.
URI
https://oasis.postech.ac.kr/handle/2014.oak/40851
ISSN
2288-6559
Article Type
Article
Citation
한국진공학회지, vol. 11, no. 4, page. 218 - 224, 2002-12
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