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Energy bandgap variation in oblique angle-deposited indium tin oxide SCIE SCOPUS

Title
Energy bandgap variation in oblique angle-deposited indium tin oxide
Authors
Kim, KPark, JHKim, HKim, JKSchubert, EFCho, J
Date Issued
2016-01-25
Publisher
AIP Publishing
Abstract
Indium tin oxide (ITO) thin films deposited using the oblique angle deposition (OAD) technique exhibit a strong correlation between structural and optical properties, especially the optical bandgap energy. The microstructural properties of ITO thin films are strongly influenced by the tilt angle used during the OAD process. When changing the tilt angle, the refractive index, porosity, and optical bandgap energy of ITO films also change due to the existence of a preferential growth direction at the interface between ITO and the substrate. Experiments reveal that the ITO film's optical bandgap varies from 3.98 eV (at normal incident deposition) to 3.87 eV (at a 60 degrees tilt angle). (C) 2016 AIP Publishing LLC.
Keywords
Photonic bandgap materials; Refractive index; Electron beam deposition; Thin film growth; X-ray diffraction
URI
https://oasis.postech.ac.kr/handle/2014.oak/36488
DOI
10.1063/1.4940998
ISSN
0003-6951
Article Type
Article
Citation
APPLIED PHYSICS LETTERS, vol. 108, no. 4, page. 41910, 2016-01-25
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김종규KIM, JONG KYU
Dept of Materials Science & Enginrg
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