Diffuse x-ray reflectivity study of interface roughness in Mo/Si multilayers
SCIE
SCOPUS
- Title
- Diffuse x-ray reflectivity study of interface roughness in Mo/Si multilayers
- Authors
- Lee, DR; Park, YJ; Jeong, YH; Lee, KB; Takenaka, H
- Date Issued
- 1999-01
- Publisher
- JAPAN J APPLIED PHYSICS
- Abstract
- Diffuse x-ray reflectivity intensities mere measured to characterize interface morphologies of Mo/Si multilayers with and without interleaved carbon thin layers. Parameters related to the interface morphologies can be obtained by fitting the measured intensities within the distorted wave Born approximation in such a way that intermixing widths of graded interfaces, correlated interface roughness amplitudes and vertical correlation lengths are obtained. The interface parameters of Mo/Si and Mo/C/Si/C multilayers are compared for as-grown samples and annealed ones.
- Keywords
- Mo/Si multilayer; carbon barrier; diffuse x-ray reflectivity; correlated roughness; SCATTERING; MIRRORS; LAYERS; FILMS
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/33779
- DOI
- 10.7567/JJAPS.38S1.285
- ISSN
- 0021-4922
- Article Type
- Article
- Citation
- JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, vol. 38, page. 285 - 288, 1999-01
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