E-beam lithography and electrodeposition fabrication of thick nanostructured devices

Abstract

A nanofabrication approach based on advanced e-beam lithography and electrodeposition successfully produced high-resolution (approximate to 40 nm line width) metal structures with high aspect ratio (>12) and high density. The combination of these characteristics is essential for hard-x-ray optical components such as zone plates, for x-ray lithography masks and for other devices.