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E-beam lithography and electrodeposition fabrication of thick nanostructured devices
- Title
- E-beam lithography and electrodeposition fabrication of thick nanostructured devices
- Authors
- Lo, TN; Chen, YT; Chiu, CW; Liu, CJ; Wu, SR; Lin, IK; Su, CI; Chang, WD; Hwu, Y; Shew, BY; Chiang, CC; Je, JH; Margaritondo, G
- POSTECH Authors
- Je, JH
- Date Issued
- Jan-2007
- Publisher
- IOP PUBLISHING LTD
- Keywords
- X-RAY MICROSCOPY; ZONE PLATES; ELECTRON; NANOLITHOGRAPHY; METHACRYLATE; RESIST
- ISSN
- 0022-3727
- Article Type
- Article
- Citation
- JOURNAL OF PHYSICS D-APPLIED PHYSICS, vol. 40, no. 10, page. 3172 - 3176, 2007-01
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Related Researcher
- 제정호JE, JUNG HO
- Dept of Materials Science & Enginrg