E-beam lithography and electrodeposition fabrication of thick nanostructured devices
SCIE
SCOPUS
- Title
- E-beam lithography and electrodeposition fabrication of thick nanostructured devices
- Authors
- Lo, TN; Chen, YT; Chiu, CW; Liu, CJ; Wu, SR; Lin, IK; Su, CI; Chang, WD; Hwu, Y; Shew, BY; Chiang, CC; Je, JH; Margaritondo, G
- Date Issued
- 2007-05-21
- Publisher
- IOP PUBLISHING LTD
- Abstract
- A nanofabrication approach based on advanced e-beam lithography and electrodeposition successfully produced high-resolution (approximate to 40 nm line width) metal structures with high aspect ratio (>12) and high density. The combination of these characteristics is essential for hard-x-ray optical components such as zone plates, for x-ray lithography masks and for other devices.
- Keywords
- X-RAY MICROSCOPY; ZONE PLATES; ELECTRON; NANOLITHOGRAPHY; METHACRYLATE; RESIST
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/23379
- DOI
- 10.1088/0022-3727/40/10/021
- ISSN
- 0022-3727
- Article Type
- Article
- Citation
- JOURNAL OF PHYSICS D-APPLIED PHYSICS, vol. 40, no. 10, page. 3172 - 3176, 2007-05-21
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- There are no files associated with this item.
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