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dc.contributor.authorLo, TNko
dc.contributor.authorChen, YTko
dc.contributor.authorChiu, CWko
dc.contributor.authorLiu, CJko
dc.contributor.authorWu, SRko
dc.contributor.authorLin, IKko
dc.contributor.authorSu, CIko
dc.contributor.authorChang, WDko
dc.contributor.authorHwu, Yko
dc.contributor.authorShew, BYko
dc.contributor.authorChiang, CCko
dc.contributor.authorJe, JHko
dc.contributor.authorMargaritondo, Gko
dc.date.available2016-04-01T01:38:23Z-
dc.date.created2009-02-28-
dc.date.issued2007-01-
dc.identifier.citationJOURNAL OF PHYSICS D-APPLIED PHYSICS, v.40, no.10, pp.3172 - 3176-
dc.identifier.issn0022-3727-
dc.identifier.other2007-OAK-0000006878-
dc.identifier.urihttp://oasis.postech.ac.kr/handle/2014.oak/23379-
dc.description.statementofresponsibilityX-
dc.languageEnglish-
dc.publisherIOP PUBLISHING LTD-
dc.subjectX-RAY MICROSCOPY-
dc.subjectZONE PLATES-
dc.subjectELECTRON-
dc.subjectNANOLITHOGRAPHY-
dc.subjectMETHACRYLATE-
dc.subjectRESIST-
dc.titleE-beam lithography and electrodeposition fabrication of thick nanostructured devices-
dc.typeArticle-
dc.contributor.college신소재공학과-
dc.identifier.doi10.1088/0022-3727/40-
dc.author.googleLo, TN-
dc.author.googleChen, YT-
dc.author.googleChiu, CW-
dc.author.googleLiu, CJ-
dc.author.googleWu, SR-
dc.author.googleLin, IK-
dc.author.googleSu, CI-
dc.author.googleChang, WD-
dc.author.googleHwu, Y-
dc.author.googleShew, BY-
dc.author.googleChiang, CC-
dc.author.googleJe, JH-
dc.author.googleMargaritondo, G-
dc.relation.volume40-
dc.relation.issue10-
dc.relation.startpage3172-
dc.relation.lastpage3176-
dc.contributor.id10123980-
dc.publisher.locationUK-
dc.relation.journalJOURNAL OF PHYSICS D-APPLIED PHYSICS-
dc.relation.indexSCI급, SCOPUS 등재논문-
dc.relation.sciSCI-
dc.collections.nameJournal Papers-
dc.type.rimsART-
dc.contributor.localauthorJe, JH-
dc.contributor.nonIdAuthorLo, TN-
dc.contributor.nonIdAuthorChen, YT-
dc.contributor.nonIdAuthorChiu, CW-
dc.contributor.nonIdAuthorLiu, CJ-
dc.contributor.nonIdAuthorWu, SR-
dc.contributor.nonIdAuthorLin, IK-
dc.contributor.nonIdAuthorSu, CI-
dc.contributor.nonIdAuthorChang, WD-
dc.contributor.nonIdAuthorHwu, Y-
dc.contributor.nonIdAuthorShew, BY-
dc.contributor.nonIdAuthorChiang, CC-
dc.contributor.nonIdAuthorMargaritondo, G-
dc.identifier.wosid000246577200024-
dc.date.tcdate2019-01-01-
dc.citation.endPage3176-
dc.citation.number10-
dc.citation.startPage3172-
dc.citation.titleJOURNAL OF PHYSICS D-APPLIED PHYSICS-
dc.citation.volume40-
dc.identifier.scopusid2-S2.0-34250197958-
dc.description.journalClass1-
dc.description.wostc25-

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제정호JE, JUNG HO
Dept of Materials Science & Enginrg
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