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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Lo, TN | - |
| dc.contributor.author | Chen, YT | - |
| dc.contributor.author | Chiu, CW | - |
| dc.contributor.author | Liu, CJ | - |
| dc.contributor.author | Wu, SR | - |
| dc.contributor.author | Lin, IK | - |
| dc.contributor.author | Su, CI | - |
| dc.contributor.author | Chang, WD | - |
| dc.contributor.author | Hwu, Y | - |
| dc.contributor.author | Shew, BY | - |
| dc.contributor.author | Chiang, CC | - |
| dc.contributor.author | Je, JH | - |
| dc.contributor.author | Margaritondo, G | - |
| dc.date.accessioned | 2016-04-01T01:38:23Z | - |
| dc.date.available | 2016-04-01T01:38:23Z | - |
| dc.date.created | 2009-02-28 | - |
| dc.date.issued | 2007-05-21 | - |
| dc.identifier.issn | 0022-3727 | - |
| dc.identifier.other | 2007-OAK-0000006878 | - |
| dc.identifier.uri | https://oasis.postech.ac.kr/handle/2014.oak/23379 | - |
| dc.description.abstract | A nanofabrication approach based on advanced e-beam lithography and electrodeposition successfully produced high-resolution (approximate to 40 nm line width) metal structures with high aspect ratio (>12) and high density. The combination of these characteristics is essential for hard-x-ray optical components such as zone plates, for x-ray lithography masks and for other devices. | - |
| dc.description.statementofresponsibility | X | - |
| dc.language | English | - |
| dc.publisher | IOP PUBLISHING LTD | - |
| dc.relation.isPartOf | JOURNAL OF PHYSICS D-APPLIED PHYSICS | - |
| dc.subject | X-RAY MICROSCOPY | - |
| dc.subject | ZONE PLATES | - |
| dc.subject | ELECTRON | - |
| dc.subject | NANOLITHOGRAPHY | - |
| dc.subject | METHACRYLATE | - |
| dc.subject | RESIST | - |
| dc.title | E-beam lithography and electrodeposition fabrication of thick nanostructured devices | - |
| dc.type | Article | - |
| dc.contributor.college | 신소재공학과 | - |
| dc.identifier.doi | 10.1088/0022-3727/40/10/021 | - |
| dc.author.google | Lo, TN | - |
| dc.author.google | Chen, YT | - |
| dc.author.google | Chiu, CW | - |
| dc.author.google | Liu, CJ | - |
| dc.author.google | Wu, SR | - |
| dc.author.google | Lin, IK | - |
| dc.author.google | Su, CI | - |
| dc.author.google | Chang, WD | - |
| dc.author.google | Hwu, Y | - |
| dc.author.google | Shew, BY | - |
| dc.author.google | Chiang, CC | - |
| dc.author.google | Je, JH | - |
| dc.author.google | Margaritondo, G | - |
| dc.relation.volume | 40 | - |
| dc.relation.issue | 10 | - |
| dc.relation.startpage | 3172 | - |
| dc.relation.lastpage | 3176 | - |
| dc.contributor.id | 10123980 | - |
| dc.relation.journal | JOURNAL OF PHYSICS D-APPLIED PHYSICS | - |
| dc.relation.index | SCI급, SCOPUS 등재논문 | - |
| dc.relation.sci | SCI | - |
| dc.collections.name | Journal Papers | - |
| dc.type.rims | ART | - |
| dc.identifier.bibliographicCitation | JOURNAL OF PHYSICS D-APPLIED PHYSICS, v.40, no.10, pp.3172 - 3176 | - |
| dc.identifier.wosid | 000246577200024 | - |
| dc.date.tcdate | 2019-01-01 | - |
| dc.citation.endPage | 3176 | - |
| dc.citation.number | 10 | - |
| dc.citation.startPage | 3172 | - |
| dc.citation.title | JOURNAL OF PHYSICS D-APPLIED PHYSICS | - |
| dc.citation.volume | 40 | - |
| dc.contributor.affiliatedAuthor | Je, JH | - |
| dc.identifier.scopusid | 2-s2.0-34250197958 | - |
| dc.description.journalClass | 1 | - |
| dc.description.journalClass | 1 | - |
| dc.description.wostc | 25 | - |
| dc.type.docType | Article | - |
| dc.subject.keywordPlus | X-RAY MICROSCOPY | - |
| dc.subject.keywordPlus | ZONE PLATES | - |
| dc.subject.keywordPlus | ELECTRON | - |
| dc.subject.keywordPlus | NANOLITHOGRAPHY | - |
| dc.subject.keywordPlus | METHACRYLATE | - |
| dc.subject.keywordPlus | RESIST | - |
| dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
| dc.description.journalRegisteredClass | scie | - |
| dc.description.journalRegisteredClass | scopus | - |
| dc.relation.journalResearchArea | Physics | - |
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Related Researcher
- 제정호JE, JUNG HO
- Dept of Materials Science & Enginrg