Nanolayer patterning based on surface modification with extreme ultraviolet light
SCIE
SCOPUS
- Title
- Nanolayer patterning based on surface modification with extreme ultraviolet light
- Authors
- Moon, S; Jeon, C; Hwang, HN; Hwang, CC; Song, H; Shin, HJ; Chung, SM; Park, CY
- Date Issued
- 2007-05-21
- Publisher
- WILEY-V C H VERLAG GMBH
- Abstract
- Chlorine nanolayers can be modified by extreme UV (EUV) irradiation, which can be applied to the fabrication of various surface functional-group patterns (see igure) owing to the striking contrast in reactivity between EUV-exposed and -unexposed regions. The technique provides flexibility of surface functionalization and may be applicable to the manufacture of electronic, photonic, and biomolecular nanodevices.
- Keywords
- MOLECULAR NANOSTRUCTURES; LITHOGRAPHY; GROWTH
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/23359
- DOI
- 10.1002/ADMA.2006021
- ISSN
- 0935-9648
- Article Type
- Article
- Citation
- ADVANCED MATERIALS, vol. 19, no. 10, page. 1321 - 1324, 2007-05-21
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- There are no files associated with this item.
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