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Full-field hard x-ray microscopy below 30 nm: a challenging nanofabrication achievement
- Title
- Full-field hard x-ray microscopy below 30 nm: a challenging nanofabrication achievement
- Authors
- Chen, YT; Lo, TN; Chu, YS; Yi, J; Liu, CJ; Wang, JY; Wang, CL; Chiu, CW; Hua, TE; Hwu, Y; Shen, Q; Yin, GC; Liang, KS; Lin, HM; Je, JH; Margaritondo, G
- POSTECH Authors
- Je, JH
- Date Issued
- Jan-2008
- Publisher
- IOP PUBLISHING LTD
- Keywords
- E-BEAM LITHOGRAPHY; ZONE PLATES; FABRICATION; RESOLUTION
- ISSN
- 0957-4484
- Article Type
- Article
- Citation
- NANOTECHNOLOGY, vol. 19, no. 39, 2008-01
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Related Researcher
- 제정호JE, JUNG HO
- Dept of Materials Science & Enginrg