Modeling and simulation of a large-area plasma source
SCIE
SCOPUS
- Title
- Modeling and simulation of a large-area plasma source
- Authors
- Lee, JK; Meng, L; Shin, YK; Lee, HJ; Chung, TH
- Date Issued
- 1997-09
- Publisher
- JAPAN J APPLIED PHYSICS
- Abstract
- A variant of transformer-coupled plasma, suitable for processing a large-area flat panel with good uniformity, is examined using various models and simulations. Using two-dimensional and one-dimensional fluid simulations, we present the detailed profiles of the plasma density, potential, electron temperature, electric field structure, and ion current density at the substrate. The average values compare reasonably well with those of a global (volume-averaged) model.
- Keywords
- fluid; simulation; plasma; processing; global; modeling; transformer-coupled; 2-DIMENSIONAL FLUID MODEL; RF-GLOW-DISCHARGES; SELF-CONSISTENT; CONTINUUM MODEL
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/21175
- DOI
- 10.1143/JJAP.36.5714
- ISSN
- 0021-4922
- Article Type
- Article
- Citation
- JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, vol. 36, no. 9A, page. 5714 - 5723, 1997-09
- Files in This Item:
- There are no files associated with this item.
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.