Modeling and simulation of a large-area plasma source

Abstract

A variant of transformer-coupled plasma, suitable for processing a large-area flat panel with good uniformity, is examined using various models and simulations. Using two-dimensional and one-dimensional fluid simulations, we present the detailed profiles of the plasma density, potential, electron temperature, electric field structure, and ion current density at the substrate. The average values compare reasonably well with those of a global (volume-averaged) model.