Velocity distributions in magnetron sputter
SCIE
SCOPUS
- Title
- Velocity distributions in magnetron sputter
- Authors
- Shon, CH; Lee, JK; Lee, HJ; Yang, Y; Chung, TH
- Date Issued
- 1998-12
- Publisher
- IEEE-INST ELECTRICAL ELECTRONICS ENGI
- Abstract
- Results of the particle simulation of magnetron sputter are presented. Using a kinetic code, we obtain the spatial profiles of plasma density, potential, and velocity distribution function, along with the electron temperature, the ion density, the current density, and the deposition profiles at the anode surface. The result of simulation is compared with the Child-Langmuir law applied to the magnetron discharge and the global model. The velocity distribution function of electrons is Maxwellian, but that of ions is non-Maxwellian near the cathode with the majority in the energy range below 50 eV.
- Keywords
- kinetic simulation; magnetron; sheath; sputter; velocity distribution; MONTE-CARLO SIMULATION; DISCHARGE; CATHODE; PLASMA; MODEL; DEPOSITION; SHEATH
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/20515
- DOI
- 10.1109/27.747881
- ISSN
- 0093-3813
- Article Type
- Article
- Citation
- IEEE TRANSACTIONS ON PLASMA SCIENCE, vol. 26, no. 6, page. 1635 - 1644, 1998-12
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- There are no files associated with this item.
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