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Cited 36 time in webofscience Cited 41 time in scopus
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Velocity distributions in magnetron sputter SCIE SCOPUS

Title
Velocity distributions in magnetron sputter
Authors
Shon, CHLee, JKLee, HJYang, YChung, TH
Date Issued
1998-12
Publisher
IEEE-INST ELECTRICAL ELECTRONICS ENGI
Abstract
Results of the particle simulation of magnetron sputter are presented. Using a kinetic code, we obtain the spatial profiles of plasma density, potential, and velocity distribution function, along with the electron temperature, the ion density, the current density, and the deposition profiles at the anode surface. The result of simulation is compared with the Child-Langmuir law applied to the magnetron discharge and the global model. The velocity distribution function of electrons is Maxwellian, but that of ions is non-Maxwellian near the cathode with the majority in the energy range below 50 eV.
Keywords
kinetic simulation; magnetron; sheath; sputter; velocity distribution; MONTE-CARLO SIMULATION; DISCHARGE; CATHODE; PLASMA; MODEL; DEPOSITION; SHEATH
URI
https://oasis.postech.ac.kr/handle/2014.oak/20515
DOI
10.1109/27.747881
ISSN
0093-3813
Article Type
Article
Citation
IEEE TRANSACTIONS ON PLASMA SCIENCE, vol. 26, no. 6, page. 1635 - 1644, 1998-12
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