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Cited 36 time in webofscience Cited 41 time in scopus
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dc.contributor.authorShon, CH-
dc.contributor.authorLee, JK-
dc.contributor.authorLee, HJ-
dc.contributor.authorYang, Y-
dc.contributor.authorChung, TH-
dc.date.accessioned2016-03-31T13:44:58Z-
dc.date.available2016-03-31T13:44:58Z-
dc.date.created2009-02-28-
dc.date.issued1998-12-
dc.identifier.issn0093-3813-
dc.identifier.other1999-OAK-0000000589-
dc.identifier.urihttps://oasis.postech.ac.kr/handle/2014.oak/20515-
dc.description.abstractResults of the particle simulation of magnetron sputter are presented. Using a kinetic code, we obtain the spatial profiles of plasma density, potential, and velocity distribution function, along with the electron temperature, the ion density, the current density, and the deposition profiles at the anode surface. The result of simulation is compared with the Child-Langmuir law applied to the magnetron discharge and the global model. The velocity distribution function of electrons is Maxwellian, but that of ions is non-Maxwellian near the cathode with the majority in the energy range below 50 eV.-
dc.description.statementofresponsibilityX-
dc.languageEnglish-
dc.publisherIEEE-INST ELECTRICAL ELECTRONICS ENGI-
dc.relation.isPartOfIEEE TRANSACTIONS ON PLASMA SCIENCE-
dc.subjectkinetic simulation-
dc.subjectmagnetron-
dc.subjectsheath-
dc.subjectsputter-
dc.subjectvelocity distribution-
dc.subjectMONTE-CARLO SIMULATION-
dc.subjectDISCHARGE-
dc.subjectCATHODE-
dc.subjectPLASMA-
dc.subjectMODEL-
dc.subjectDEPOSITION-
dc.subjectSHEATH-
dc.titleVelocity distributions in magnetron sputter-
dc.typeArticle-
dc.contributor.college전자전기공학과-
dc.identifier.doi10.1109/27.747881-
dc.author.googleSHON, CH-
dc.author.googleLEE, JK-
dc.author.googleLEE, HJ-
dc.author.googleYANG, Y-
dc.author.googleCHUNG, TH-
dc.relation.volume26-
dc.relation.issue6-
dc.relation.startpage1635-
dc.relation.lastpage1644-
dc.contributor.id10158178-
dc.relation.journalIEEE TRANSACTIONS ON PLASMA SCIENCE-
dc.relation.indexSCI급, SCOPUS 등재논문-
dc.relation.sciSCI-
dc.collections.nameJournal Papers-
dc.type.rimsART-
dc.identifier.bibliographicCitationIEEE TRANSACTIONS ON PLASMA SCIENCE, v.26, no.6, pp.1635 - 1644-
dc.identifier.wosid000078329600006-
dc.date.tcdate2019-01-01-
dc.citation.endPage1644-
dc.citation.number6-
dc.citation.startPage1635-
dc.citation.titleIEEE TRANSACTIONS ON PLASMA SCIENCE-
dc.citation.volume26-
dc.contributor.affiliatedAuthorLee, JK-
dc.identifier.scopusid2-s2.0-0000781665-
dc.description.journalClass1-
dc.description.journalClass1-
dc.description.wostc31-
dc.type.docTypeArticle-
dc.subject.keywordPlusMONTE-CARLO SIMULATION-
dc.subject.keywordPlusDISCHARGE-
dc.subject.keywordPlusCATHODE-
dc.subject.keywordPlusPLASMA-
dc.subject.keywordPlusMODEL-
dc.subject.keywordPlusDEPOSITION-
dc.subject.keywordPlusSHEATH-
dc.subject.keywordAuthorkinetic simulation-
dc.subject.keywordAuthormagnetron-
dc.subject.keywordAuthorsheath-
dc.subject.keywordAuthorsputter-
dc.subject.keywordAuthorvelocity distribution-
dc.relation.journalWebOfScienceCategoryPhysics, Fluids & Plasmas-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaPhysics-

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