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Microstructure of GaN nucleation layer during initial stage MOCVD growth SCIE SCOPUS

Title
Microstructure of GaN nucleation layer during initial stage MOCVD growth
Authors
Kim, CCJe, JHYi, MSNoh, DYDegave, FRuterana, P
Date Issued
2001-05-22
Publisher
ELSEVIER SCIENCE SA
Abstract
The microstructure in GaN nucleation layers was studied in synchrotron X-ray scattering and transmission electron microscopy experiments. We revealed the existence of tensile-strained interfacial domains, which was originated from 6/7 matched interface structure. (C) 2001 Elsevier Science S.A. All rights reserved.
Keywords
GaN; nucleation layer; microstructure; tensile strain; interface structure; LIGHT-EMITTING-DIODES; X-RAY-SCATTERING; BLUE; EPITAXY
URI
https://oasis.postech.ac.kr/handle/2014.oak/19546
DOI
10.1016/S0921-5107(00)00757-1
ISSN
0921-5107
Article Type
Article
Citation
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, vol. 82, no. 1-3, page. 108 - 110, 2001-05-22
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제정호JE, JUNG HO
Dept of Materials Science & Enginrg
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