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전체 가 나 다 라 마 바 사 아 자 차 카 타 파 하

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Showing results 1 to 12 of 12

Article

Chemical vapor deposition of copper thin films with (hexafluoroacetylacetonate)Cu(allyltrimethylsilane)SCIESCOPUS

ELECTROCHEMICAL AND SOLID STATE LETTERS, vol. 1, no. 1, page. 32 - 33, 1998-07

Article

Comparison of (hexafluoroacetylacetonate) Cu(vinyltrimethylsilane) and (hexafluoroacetylacetonate) Cu(allyltrimethylsilane) for metalorganic chemical vapor deposition of copperSCIESCOPUS

JOURNAL OF MATERIALS RESEARCH, vol. 14, no. 3, page. 975 - 979, 1999-03

Article

Comparison of tetrakis(dimethylamido)titanium and tetrakis(diethylamido)titanium as precursors for metallorganic chemical vapor deposition of titanium nitrideSCIESCOPUS

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, vol. 146, no. 5, page. 1804 - 1808, 1999-05

Article

Crystal structure of Cmr5 from Pyrococcus furiosus and its functional implicationsSCIESCOPUS

FEBS Letters, vol. 587, no. 6, page. 562 - 568, 2013-03

Article

Effect of the gas-phase reaction in metallorganic chemical vapor deposition of TiN from tetrakis(dimethylamido)titaniumSCIESCOPUS

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, vol. 145, no. 7, page. 2453 - 2456, 1998-07

Article

Fourier transform infrared diagnostics of gas phase reactions in the metalorganic chemical vapor deposition of aluminum from dimethylethylamine alaneSCIESCOPUS

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, vol. 16, no. 2, page. 419 - 423, 1998-03

Article

Fourier transform infrared spectroscopy studies on thermal decomposition of tetrakis-dimethyl-amido zirconium for chemical vapor deposition of ZrNSCIESCOPUSKCI

KOREAN JOURNAL OF CHEMICAL ENGINEERING, vol. 21, no. 6, page. 1256 - 1259, 2004-11

Article

Growth rate and microstructure of copper thin films deposited with metal-organic chemical vapor deposition from hexafluoroacetylacetonate copper(I) allyltrimethylsilaneSCIESCOPUS

THIN SOLID FILMS, vol. 335, no. 1-2, page. 229 - 236, 1998-12-14

Article

Hexafluoroacetylacetonate Cu vinylcyclohexane as a liquid precursor for low-temperature chemical vapor deposition of copper thin filmsSCIESCOPUS

ELECTROCHEMICAL AND SOLID STATE LETTERS, vol. 2, no. 1, page. 22 - 23, 1999-01

Article

Metalorganic chemical vapor deposition of aluminum from tetramethylethylenediamine alaneSCIESCOPUS

JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, vol. 10, no. 4, page. 285 - 290, 1999-06

Article

Structures of Iron-Dependent Alcohol Dehydrogenase 2 from Zymomonas mobilis ZM4 with and without NAD(+) CofactorSCIESCOPUS

Journal of Molecular Biology, vol. 407, no. 3, page. 413 - 424, 2011-04

Article

The effect of additives on the viscosity of dimethylaluminum hydride and FTIR diagnostics of the gas-phase reactionSCIESCOPUS

THIN SOLID FILMS, vol. 348, no. 1-2, page. 130 - 133, 1999-07-06

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