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전체 가 나 다 라 마 바 사 아 자 차 카 타 파 하

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Showing results 181 to 200 of 205

Article

Remote plasma enhanced chemical vapor deposition of silicon films at low temperatures from Si2H6-H-2-SiF4SCIESCOPUS

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, vol. 143, no. 8, page. 2640 - 2645, 1996-08

Article

Remote plasma enhanced metal organic chemical vapor deposition of TiN for diffusion barrierSCIESCOPUS

KOREAN JOURNAL OF CHEMICAL ENGINEERING, vol. 13, no. 5, page. 510 - 514, 1996-09

Article

Remote plasma enhanced metalorganic chemical vapor deposition of TiN from tetrakis-dimethyl-amido-titaniumSCIESCOPUS

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, vol. 18, no. 6, page. 2822 - 2826, 2000-11

Article

Remote plasma-enhanced chemical vapor deposition of nanoporous low-dielectric constant SiCOH films using vinyltrimethylsilaneSCIESCOPUS

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, vol. 149, no. 8, page. F92 - F97, 2002-08

Article

Resistance switching behaviors of hafnium oxide films grown by MOCVD for nonvolatile memory applicationsSCIESCOPUS

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, vol. 155, no. 2, page. H92 - H96, 2008-01

Article

Resistive switching characteristics of ZnO thin film grown on stainless steel for flexible nonvolatile memory devicesSCIESCOPUS

APPLIED PHYSICS LETTERS, vol. 95, no. 26, page. 262113 - 262113, 2009-12-28

Article

Self-assembled monolayer formation on molybdenum with octadecyltrichlorosilane and phenethyltrichlorosilane and measurement of molybdenum-pentacene interface propertiesSCIESCOPUS

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, vol. 155, no. 6, page. H357 - H362, 2008-01

Article

Simplified simulation of step coverage in chemical vapor deposition with a hemispherical vapor source modelSCIESCOPUS

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, vol. 144, no. 5, page. 1803 - 1807, 1997-05

Article

SiO2 Atomic Layer Deposition Using Tris(dimethylamino)silane and Hydrogen Peroxide Studied by in Situ Transmission FTIR SpectroscopySCIESCOPUS

JOURNAL OF PHYSICAL CHEMISTRY C, vol. 113, no. 19, page. 8249 - 8257, 2009-05-14

Article

Size-Controlled Soft-Template Synthesis of Carbon Nanodots toward Versatile Photoactive MaterialsSCIESCOPUS

Small, vol. 10, no. 3, page. 506 - 513, 2014-02

Article

Soft-template synthesis of nitrogen-doped carbon nanodots: tunable visible-light photoluminescence and phosphor-based light-emitting diodesSCOPUS

JOURNAL OF MATERIALS CHEMISTRY, vol. 2, no. 21, page. 4221 - 4226, 2014-04

Article

Solution-based fabrication of ZnO /ZnSe heterostructure nanowire arrays for solar energy conversionSCIESCOPUS

JOURNAL OF MATERIALS CHEMISTRY, vol. 21, no. 44, page. 17816 - 17822, 2011-10

Article

Solution-processed crack-free oxide films formed using SiO2 nanoparticles and organoalkoxysiloxane precursorsSCIESCOPUS

APPLIED SURFACE SCIENCE, vol. 342, page. 168 - 173, 2015-07-01

Article

Structural changes of silicon dioxide films caused by synchrotron irradiationSCIESCOPUS

JOURNAL OF APPLIED PHYSICS, vol. 80, no. 2, page. 1236 - 1238, 1996-07-15

Article

Sub-micrometer-sized Graphite As a Conducting and Catalytic Counter Electrode for Dye-sensitized Solar CellsSCIESCOPUS

ACS APPLIED MATERIALS & INTERFACES, vol. 3, no. 3, page. 857 - 862, 2011-03

Article

Sulfur-incorporated carbon quantum dots with a strong long-wavelength absorption bandSCIESCOPUS

Journal of Materials Chemistry C, vol. 1, no. 11, page. 2002 - 2008, 2013-03

Article

Surface passivation technique for selective hole filling by chemical vapor depositionSCIESCOPUS

JOURNAL OF MATERIALS SCIENCE LETTERS, vol. 17, no. 11, page. 947 - 949, 1998-06-01

Article

The effect of additives on the viscosity of dimethylaluminum hydride and FTIR diagnostics of the gas-phase reactionSCIESCOPUS

THIN SOLID FILMS, vol. 348, no. 1-2, page. 130 - 133, 1999-07-06

Article

The effect of carrier gas and H(hfac) on MOCVD Cu films using (hfac)Cu(1,5-COD) as a precursorSCIESCOPUS

JOURNAL OF ELECTRONIC MATERIALS, vol. 30, no. 8, page. 1028 - 1034, 2001-08

Article

The effect of He or Ar/O-2 plasma treatment on Si surface prior to chemical vapor deposition of SiO2SCIESCOPUS

JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, vol. 15, no. 1, page. 37 - 41, 2004-01

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