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SONG, HO JIN(송호진)
scopus
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Dept of Electrical Engineering(전자전기공학과)
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Publication & Time Cited Count (For the Last 5 years)
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Date issued
2008
1
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Article
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atomic-layer etching (ALET)
1
channel electron saturation veloc...
1
gate-recess process
1
pseudomorphic high-electron mobil...
1
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SCIE
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Date Issued
: 2008
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Article
A two-step-recess process based on atomic-layer etching for high-performance In(0.52)Al(0.48)As/In(0-53)Ga(0.47)As p-HEMTs
SCIE
SCOPUS
IEEE TRANSACTIONS ON ELECTRON DEVICES, vol. 55, no. 7, page. 1577 - 1584, 2008-07
Kim, TW
;
Kim, DH
;
Park, SD
;
Shin, SH
;
Jo, SJ
;
et al
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