Inorganic polymer photoresist for direct ceramic patterning by photolithography
SCIE
SCOPUS
- Title
- Inorganic polymer photoresist for direct ceramic patterning by photolithography
- Authors
- Pham, TA; Kim, P; Kwak, M; Suh, KY; Kim, DP
- Date Issued
- 2007-08
- Publisher
- ROYAL SOC CHEMISTRY
- Abstract
- A novel negative, inorganic polymer photoresist was demonstrated to be suitable for simple and direct fabrication of tribological SiCN-based ceramic microstructures via UV photolithography and subsequent pyrolysis at 800 degrees C.
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/9929
- DOI
- 10.1039/B708480C
- ISSN
- 1359-7345
- Article Type
- Article
- Citation
- CHEMICAL COMMUNICATIONS, no. 39, page. 4021 - 4023, 2007-08
- Files in This Item:
-
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.