Kinetic study of Al-mole fraction in AlxGa1-xN grown on c-plane sapphire and AlN bulk substrates by metal-organic vapor-phase epitaxy
SCIE
SCOPUS
- Title
- Kinetic study of Al-mole fraction in AlxGa1-xN grown on c-plane sapphire and AlN bulk substrates by metal-organic vapor-phase epitaxy
- Authors
- Xi, YA; Chen, KX; Mont, FW; Kim, JK; Lee, W; Schubert, EF; Liu, W; Li, X; Smart, JA
- Date Issued
- 2007-01-29
- Publisher
- AMER INST PHYSICS
- Abstract
- A systematic study is performed on the dependence of the Al-mole fraction in AlxGa1-xN on the organometallic group-III precursor flow during metal-organic vapor-phase epitaxy. When keeping the total organometallic volume flow constant, a nonlinear concave bowing relationship is found between the Al-mole fraction (for 0 <= x <= 1) and the relative trimethylaluminum volume flow. A kinetic model, which takes into account the growth rate ratio between GaN and AlN (g(GaN)/g(AlN)), is developed to explain such concave bowing relationship. The experimental data are in excellent agreement with the theoretical model. For AlxGa1-xN growth on AlN bulk substrates, it is found that the Al-mole fraction is smaller and the growth rate ratio is larger than on sapphire substrates. The authors also investigate the incorporation of Al in AlxGa1-xN as a function of the group-III precursor molar flow rate. A positive convex bowing relationship is found between Al-mole fraction and the relative trimethylaluminum molar flow, which is consistent with our model. (c) 2007 American Institute of Physics.
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/9562
- DOI
- 10.1063/1.2437681
- ISSN
- 0003-6951
- Article Type
- Article
- Citation
- APPLIED PHYSICS LETTERS, vol. 90, no. 5, 2007-01-29
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