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Electron beam lithography overlay process with sub-20nm accuracy for 3D nanoarchitecturing
- Title
- Electron beam lithography overlay process with sub-20nm accuracy for 3D nanoarchitecturing
- Authors
- RHO, JUNSUK; KIM, INKI; YOON, GWANHO; JEONG, HEONYEONG
- Date Issued
- 2018-06-26
- Publisher
- 대한기계학회, 서강대학교
- Article Type
- Conference
- Citation
- The 15th International Workshop on Nanomechanical Sensing (NMC 2018), 2018-06-26
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Related Researcher
- 노준석RHO, JUNSUK
- Dept of Mechanical Enginrg