Atomic Layer Deposition of Zirconium Silicate Films Using Chloride and Alkoxide Compounds
- Title
- Atomic Layer Deposition of Zirconium Silicate Films Using Chloride and Alkoxide Compounds
- Authors
- 이시우
- Publisher
- AVS
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/91300
- Article Type
- Conference
- Citation
- Proc. of AVS Topical Conference(ALD 2002)
- Files in This Item:
- There are no files associated with this item.
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