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Atomic layer deposition of hafnium silicate films using dichlorobis[bis(trimethylsilyl)amido]hafnium and water

Title
Atomic layer deposition of hafnium silicate films using dichlorobis[bis(trimethylsilyl)amido]hafnium and water
Authors
이시우
Publisher
American Vacuum Society
URI
https://oasis.postech.ac.kr/handle/2014.oak/91276
Article Type
Conference
Citation
Atomic Layer Deposition (ALD 2003)
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