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Electrical property improvements of high k gate oxide by F plasma treatment

Title
Electrical property improvements of high k gate oxide by F plasma treatment
Authors
김형준
URI
https://oasis.postech.ac.kr/handle/2014.oak/86813
Article Type
Conference
Citation
ECS spring 2008
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김형준KIM, HYUNGJUN
Dept of Materials Science & Enginrg
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