Characterization of nanoporous low-dielectric constant SiCOH films using organosilane precursors
- Title
- Characterization of nanoporous low-dielectric constant SiCOH films using organosilane precursors
- Authors
- 이문호
- Publisher
- Pohang Accelerator Laboratory
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/85860
- Article Type
- Conference
- Citation
- The 18th Synchrotron Radiation Users’ Workshop & KOSUA Meeting
- Files in This Item:
- There are no files associated with this item.
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.