Cobalt Atomic Layer Deposition for Nanoscale Contact Applications
- Title
- Cobalt Atomic Layer Deposition for Nanoscale Contact Applications
- Authors
- 김형준
- Publisher
- California, USA
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/83915
- Article Type
- Conference
- Citation
- 25th International VLSI/ULSI Multilevel Interconnection Conference
- Files in This Item:
- There are no files associated with this item.
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