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Electrical Properties of Plasma-Enhanced Atomic Layer Deposition HfO2/HfOxNy/HfO2 Gate Oxide
- Title
- Electrical Properties of Plasma-Enhanced Atomic Layer Deposition HfO2/HfOxNy/HfO2 Gate Oxide
- Authors
- 김형준
- Article Type
- Conference
- Citation
- 2008년도 한국재료학회 추계학술발표대회
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Related Researcher
- 김형준KIM, HYUNGJUN
- Dept of Materials Science & Enginrg