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Effects of post etch treatments on contaminated silicon surface due to CHF3/C2F6 reactive ion etching
- Title
- Effects of post etch treatments on contaminated silicon surface due to CHF3/C2F6 reactive ion etching
- Authors
- 이종람
- Date Issued
- 1993-01-01
- Publisher
- Material Research Society
- Article Type
- Conference
- Citation
- Materials Research Symposium Proceedings, page. 243 - 248, 1993-01-01
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Related Researcher
- 이종람LEE, JONG LAM
- Dept of Materials Science & Enginrg