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The influence of the substrate materials on the relevant dose and CD in the 0.1㎛ regime proximity x-ray lithography
- Title
- The influence of the substrate materials on the relevant dose and CD in the 0.1㎛ regime proximity x-ray lithography
- Authors
- 김오현
- Date Issued
- 1999-11-01
- Article Type
- Conference
- Citation
- Extended Abstract of XEL '99, 1999-11-01
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Related Researcher
- 김오현KIM, OHYUN
- Dept of Electrical Enginrg