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Dose and shape modification proximity effect correction for forward-scattering range scale features in electron beam lithography

Title
Dose and shape modification proximity effect correction for forward-scattering range scale features in electron beam lithography
Authors
김오현
Date Issued
2000-07-01
Publisher
XEL
URI
https://oasis.postech.ac.kr/handle/2014.oak/77512
Article Type
Conference
Citation
MNC 2000, 2000-07-01
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김오현KIM, OHYUN
Dept of Electrical Enginrg
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