Dose and shape modification proximity effect correction for forward-scattering range scale features in electron beam lithography
- Title
- Dose and shape modification proximity effect correction for forward-scattering range scale features in electron beam lithography
- Authors
- 김오현
- Date Issued
- 2000-07-01
- Publisher
- XEL
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/77512
- Article Type
- Conference
- Citation
- MNC 2000, 2000-07-01
- Files in This Item:
- There are no files associated with this item.
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