Chemical Vapor Deposition of TiO2, ZrO2, and Pb(Zr,Ti)O3 films with Pb(tmhd)2-PMDT, Ti(dmae)4, and Zr(dmae)4 as metalorganic precursors
- Title
- Chemical Vapor Deposition of TiO2, ZrO2, and Pb(Zr,Ti)O3 films with Pb(tmhd)2-PMDT, Ti(dmae)4, and Zr(dmae)4 as metalorganic precursors
- Authors
- 이시우
- Date Issued
- 2000-08-04
- Publisher
- 한국화학공학회 재료부문위원회
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/76285
- Article Type
- Conference
- Citation
- 제3회 CVD 심포지움, page. 15, 2000-08-04
- Files in This Item:
- There are no files associated with this item.
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