FinFET Process Refinement for Improved Mobility and Gate Work Function Engineering
- Title
- FinFET Process Refinement for Improved Mobility and Gate Work Function Engineering
- Authors
- 이정수
- Date Issued
- 2002-12-01
- Publisher
- IEEE
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/74168
- Article Type
- Conference
- Citation
- IEEE International Electron Devices Meeting, page. 259 - 262, 2002-12-01
- Files in This Item:
- There are no files associated with this item.
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