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Atomic layer chemical vapor deposition and characterization of hafnium silicate films

Title
Atomic layer chemical vapor deposition and characterization of hafnium silicate films
Authors
용기중
POSTECH Authors
용기중
Date Issued
1-Oct-2004
Publisher
화학공학회
URI
http://oasis.postech.ac.kr/handle/2014.oak/73439
Article Type
Conference
Citation
2004 화학공학회 가을 학술대회, 2004-10-01
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용기중YONG, KIJUNG
Dept. of Chemical Enginrg
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