The plasma-enhanced atomic layer deposition HfO2 and HfOxNy films on Si substrates with various crystal orientations
- Title
- The plasma-enhanced atomic layer deposition HfO2 and HfOxNy films on Si substrates with various crystal orientations
- Authors
- 김형준
- Date Issued
- 2007-04-01
- Publisher
- The Korean Ceramic Society
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/72591
- Article Type
- Conference
- Citation
- The Korean Ceramic Society, 2007-04-01
- Files in This Item:
- There are no files associated with this item.
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