Highly conformal Ru Atomic Layer Deposition for application to nanoelectronic devices
- Title
- Highly conformal Ru Atomic Layer Deposition for application to nanoelectronic devices
- Authors
- 김형준
- Date Issued
- 2007-06-01
- Publisher
- ECS
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/72567
- Article Type
- Conference
- Citation
- Electrochemical Society Meeting 2007, 2007-06-01
- Files in This Item:
- There are no files associated with this item.
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