The atomic layer deposition of oxides and metals for next generation semiconductor devices
- Title
- The atomic layer deposition of oxides and metals for next generation semiconductor devices
- Authors
- 김형준
- Date Issued
- 2008-03-16
- Publisher
- ISTC
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/72482
- Article Type
- Conference
- Citation
- ISTC 2008, 2008-03-16
- Files in This Item:
- There are no files associated with this item.
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