Improvement of electrical properties in high k gate oxide by F plasma treatmetns
- Title
- Improvement of electrical properties in high k gate oxide by F plasma treatmetns
- Authors
- 김형준
- Date Issued
- 2008-04-01
- Publisher
- The korean Physical Society
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/72481
- Article Type
- Conference
- Citation
- The korean Physical Society, 2008-04-01
- Files in This Item:
- There are no files associated with this item.
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