Gas Permeation Barrier and Water Resistance Properties of Al2O3/TiO2 Nano-Laminated Film Deposited by Plasma-Enhanced Atomic Layer Deposition for OTFT Passivation
- Title
- Gas Permeation Barrier and Water Resistance Properties of Al2O3/TiO2 Nano-Laminated Film Deposited by Plasma-Enhanced Atomic Layer Deposition for OTFT Passivation
- Authors
- 박찬언; 김래호; 김경훈; 박세열; 박선욱; 정용진
- Date Issued
- 2013-11-13
- Publisher
- Center for Advanced Soft Electronics (CASE), Polymer Research Institute (PRI), POSTECH
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/65391
- Article Type
- Conference
- Citation
- A-COE 2013 5th Asian Conference on Organic Electronics, 2013-11-13
- Files in This Item:
- There are no files associated with this item.
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